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Ultrahydrophobic organosilicon polymer coatings are an alternative to perfluorinated and polyfluorinated compounds (PFAS), which are currently still used in many industrial applications and sectors. The Leibniz Institute of Plasma Science and Technology (INP) in Greifswald has now developed a method that can be used to produce such water-repellent coatings.
Why PFAS are under discussionPFAS compounds have been used for decades to refine a wide range of products. This applies to medical technology, among others, but also to the semiconductor industry and the textile industry. PFAS are extremely water-repellent and therefore offer many advantages such as good non-stick properties and high resistance to chemicals. However, PFAS compounds can accumulate in the environment and in living organisms due to their great stability and are also known as "eternal chemicals". They are therefore considered harmful to the environment and health and have been banned in some applications in the EU since 2006.
As all perfluorinated and polyfluorinated compounds are expected to be included in the global ban list of the Stockholm Convention by 2025 at the latest, high-tech industries that rely on these ultra-hydrophobic coatings are facing challenges.PFAS alternative based on plasma: Promising and environmentally friendly
The organosilicon polymer layer recently developed by INP is based on plasma technology. It is a promising and environmentally friendly alternative to PFAS-containing coatings. It is mechanically and chemically stable, up to 200 nm thick and opaque, storable, washable and reproducible. The coatings are suitable for many materials, such as metals, plastics and semiconductors.
Since the organosilicon polymer coating can also be applied to thermolabile plastics, it is very suitable for finishing in medical technology. This allows the surfaces of implantable devices, such as pacemakers or artificial joints, to be modified.Plasma process is set up as a normal pressure processResearchers at INP are currently working on transferring the low-pressure process for depositing the organosilicon polymer layer to a normal-pressure process. They are also developing concepts for scaling up the technology.
„We are very satisfied with the results of our research“, says Dr Frank Hempel, head of the Plasma Surface Technology research department at the INP. The organosilicon polymer layer is a promising alternative to PFAS-containing layers and offers a wide range of possibilities for applications in various industrial sectors.The above texts, or parts thereof, were automatically translated from the original language text using a translation system (DeepL API).
Despite careful machine processing, translation errors cannot be ruled out.